| 产品名称: | UV5 (UV sensitive mutant of CHO) |
|---|---|
| 商品货号: | TS210689 |
| Organism: | Cricetulus griseus, hamster, Chinese |
| Tissue: | ovary |
| Product Format: | frozen |
| Morphology: | epithelial-like |
| Culture Properties: | monolayer and suspension |
| Biosafety Level: | 1
Biosafety classification is based on U.S. Public Health Service Guidelines, it is the responsibility of the customer to ensure that their facilities comply with biosafety regulations for their own country. |
| Gender: | female |
| Applications: | UV5 is a UV sensitive line derived from AA8 (see ATCC CRL-1859).
The line is defective in nucleotide excision repair, is sensitive to bulky adduct mutagens and belongs to excision repair complementation group 1. |
| Storage Conditions: | liquid nitrogen vapor phase |
| Derivation: | This line is a derivative of the CHO-K1 cell line (see ATCC CCL-61). UV5 is a UV sensitive line derived from AA8 (see ATCC CRL-1859). |
| Clinical Data: | female |
| Comments: | This line is a derivative of the CHO-K1 cell line (see ATCC CCL-61).
UV5 is a UV sensitive line derived from AA8 (see ATCC CRL-1859).
The line is defective in nucleotide excision repair, is sensitive to bulky adduct mutagens and belongs to excision repair complementation group 1. |
| Complete Growth Medium: | Alpha minimum essential medium without ribonucleosides and deoxyribonucleosides, 90%; fetal bovine serum, 10%
|
| Subculturing: | Volumes used in this protocol are for 75 cm2 flask; proportionally reduce or increase amount of dissociation medium for culture vessels of other sizes. The suspended cells are viable and can be used to start new cultures.
Subcultivation Ratio: 1:4 to 1:12 Note: For more information on enzymatic dissociation and subculturing of cell lines consult Chapter 13 in Culture of Animal Cells, a Manual of Basic Technique by R. Ian Freshney,xa05th edition, published by Wiley-Liss, N.Y., 2005. |
| Cryopreservation: | Complete growth medium described above supplemented with 5% (v/v) DMSO.xa0 Cell culture tested DMSO is available as ATCC Catalog No. 4-X. |
| Culture Conditions: | Temperature: 37°C
Atmosphere: Air, 95%; Carbon dioxide (CO2), 5% |
| Population Doubling Time: | 13 hrs |
| Name of Depositor: | LH Thompson |
| References: | Thompson LH, et al. Repair of DNA adducts in asynchronous CHO cells and the role of repair in cell killing and mutation induction in synchronous cells treated with 7-bromomethylbenzaanthracene. Somatic Cell Mol. Genet. 10: 183-194, 1984. PubMed: 6584989 Thompson LH, et al. Genetic diversity of UV-sensitive DNA repair mutants of Chinese hamster ovary cells. Proc. Natl. Acad. Sci. USA 78: 3734-3737, 1981. PubMed: 6943579 Hoy CA, et al. Defective DNA cross-link removal in Chinese hamster cell mutants hypersensitive to bifunctional alkylating agents. Cancer Res. 45: 1737-1743, 1985. PubMed: 3919945 Busch D, et al. Summary of complementation groups of UV-sensitive CHO cell mutants isolated by large-scale screening. Mutagenesis 4: 349-354, 1989. PubMed: 2687628 Bessho T, et al. Initiation of DNA interstrand cross-link repair in humans: the nucleotide excision repair system makes dual incisions 5" to the cross-linked base and removes a 22- to 28-nucleotide-long damage-free strand. Mol. Cell. Biol. 17: 6822-6830, 1997. PubMed: 9372913 Reardon JT, et al. Isolation and characterization of two human transcription factor IIH (TFIIH)-related complexes: ERCC2/CAKand TFIIH. Proc. Natl. Acad. Sci. USA 93: 6482-6487, 1996. PubMed: 8692841 Thompson LH, et al. Hypersensitivity to mutation and sister-chromatid-exchange induction in CHO cell mutants defective in incising DNA containing UV lesions. Somatic Cell Genet. 8: 759-773, 1982. PubMed: 7163954 . Cellular responses to DNA damage. New York: Liss; 1983. Hay, R. J., Caputo, J. L., and Macy, M. L., Eds. (1992), ATCC Quality Control Methods for Cell Lines. 2nd edition, Published by ATCC. Caputo, J. L., Biosafety procedures in cell culture. J. Tissue Culture Methods 11:223-227, 1988. Fleming, D.O., Richardson, J. H., Tulis, J.J. and Vesley, D., (1995) Laboratory Safety: Principles and Practice. Second edition, ASM press, Washington, DC. |